|
|
|
|
Á¦Ç°¿¡ ´ëÇÑ ±¸ÀÔ¹®ÀÇ
¶Ç´Â ÀÚ¼¼ÇÑ Á¤º¸¸¦
¿øÇϽô ºÐÀº Á¦Ç°¹®ÀǸ¦
Ŭ¸¯ÇÏ½Ã°í ³»¿ëÀ»
ÀÔ·ÂÇØ ÁÖ½Ã¸é ºü¸¥
½Ã°£ ³»¿¡ ´äº¯µå¸®µµ·Ï
ÇÏ°Ú½À´Ï´Ù.
|
|
|
|
Equipment
|
Spin Cleaning System
|
Maker
|
DS Semicon Co., Ltd.
|
Model
|
Spin Cleaning System
|
Status
|
Excellent
|
Location
|
In Factory
|
Application
|
Cleaning System for Wafer
|
|
|
|
|
Á¦¸ñ ¾øÀ½
Workpiece size |
¥Õ8" |
Applicable tape
frame size |
2~8" |
Table roating speed |
0~2000 rpm |
Spinner discharge
pressure |
100 kgf/cm©÷ |
|
|
|
|
|
|
|
|
|
|